JPH0352213B2 - - Google Patents

Info

Publication number
JPH0352213B2
JPH0352213B2 JP58164222A JP16422283A JPH0352213B2 JP H0352213 B2 JPH0352213 B2 JP H0352213B2 JP 58164222 A JP58164222 A JP 58164222A JP 16422283 A JP16422283 A JP 16422283A JP H0352213 B2 JPH0352213 B2 JP H0352213B2
Authority
JP
Japan
Prior art keywords
resist
resist layer
hard mask
layer
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58164222A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6057624A (ja
Inventor
Yasuo Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58164222A priority Critical patent/JPS6057624A/ja
Publication of JPS6057624A publication Critical patent/JPS6057624A/ja
Publication of JPH0352213B2 publication Critical patent/JPH0352213B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58164222A 1983-09-08 1983-09-08 ハ−ドマスクの製作方法 Granted JPS6057624A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58164222A JPS6057624A (ja) 1983-09-08 1983-09-08 ハ−ドマスクの製作方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58164222A JPS6057624A (ja) 1983-09-08 1983-09-08 ハ−ドマスクの製作方法

Publications (2)

Publication Number Publication Date
JPS6057624A JPS6057624A (ja) 1985-04-03
JPH0352213B2 true JPH0352213B2 (en]) 1991-08-09

Family

ID=15788989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58164222A Granted JPS6057624A (ja) 1983-09-08 1983-09-08 ハ−ドマスクの製作方法

Country Status (1)

Country Link
JP (1) JPS6057624A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63244622A (ja) * 1987-03-30 1988-10-12 Nec Corp 半導体装置の製造方法
JP2753032B2 (ja) * 1989-04-13 1998-05-18 株式会社東芝 半導体製造用マスクの製造方法及びその製造装置
JPH07169675A (ja) * 1993-12-16 1995-07-04 Natl Res Inst For Metals 電子線リソグラフィー用基板材料

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170830U (ja) * 1982-05-10 1983-11-15 沖電気工業株式会社 描画用マスクホルダとマスク基板との導通機構

Also Published As

Publication number Publication date
JPS6057624A (ja) 1985-04-03

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